Low resistivity tungsten for 32 nm node MOL contacts and beyond
- Filippos Papadatos
- Keith Wong
- et al.
- 2012
- Microelectronic Engineering
Paper
Publications
5 results for Filippos Papadatos
Comparative study of CVD TiN vs. ALD TiN for contact metallization in 32nm node and beyond
- Valli Arunachalam
- Filippos Papadatos
- et al.
- 2010
- ADMETA 2010
Conference paperAdvanced metallization developments for 32-nm node CMOS technology contact architecture
- Doug H. Lee
- Valli Arunachalam
- et al.
- 2009
- ADMETA 2009
Conference paperElectrical properties of ultrathin Al2O3 films grown by metalorganic chemical vapor deposition for advanced complementary metal-oxide semiconductor gate dielectric applications
- Spyridon Skordas
- Filippos Papadatos
- et al.
- 2005
- Journal of Materials Research
PaperLow temperature metal organic chemical vapor deposition of aluminum oxide thin films for advanced CMOS gate dielectric applications
- Spyridon Skordas
- Filippos Papadatos
- et al.
- 2002
- MRS Proceedings 2002
Conference paper