Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture: Tool-to-tool comparison
- Gregory McIntyre
- Richard Tu
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Publications
4 results for Richard Tu
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture
- Gregory McIntyre
- Richard Tu
- 2009
- SPIE Advanced Lithography 2009
Conference paperResist-based polarization monitoring for 193nm high-numerical aperture lithography
- Richard Tu
- Gregory McIntyre
- 2008
- Lithography Asia 2008
Conference paperMonitoring polarization at 193nm high-numerical aperture with phase shift masks: Experimental results and industrial outlook
- Gregory McIntyre
- Richard Tu
- 2008
- SPIE Advanced Lithography 2008
Conference paper