Publications

14 results for L. Black

Effect of contact liner stress in high-performance FDSOI devices with ultra-thin silicon channels and 30 nm gate lengths
- - D. Singh
  - J. Hergenrother
  - et al.
- 2005
- IEEE International SOI Conference 2005
Conference paper
Dual stress liner enhancement in hybrid orientation technology
- - C. Sheraw
  - M. Yang
  - et al.
- 2005
- VLSI Technology 2005
Conference paper
Stress memorization in high-performance FDSOI devices with ultra-thin silicon channels and 25nm gate lengths
- - D. Singh
  - J. Sleight
  - et al.
- 2005
- IEDM 2005
Conference paper
High performance 65 nm SOI technology with enhanced transistor strain and advanced-low-K BEOL
- - W.-H. Lee
  - A. Waite
  - et al.
- 2005
- IEDM 2005
Conference paper