Evaluation of device damage from e-beam curing of ultra low-k BEOL dielectricsS. MehtaC. Dimitrakopouloset al.2005AMC 2005Conference paper
Determination of the thermal conductivity of composite low-k dielectrics for advanced interconnect structuresF. ChenJ. Gillet al.2006Microelectronics ReliabilityPaper
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High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cellE. LeobandungH. Nayakamaet al.2005VLSI Technology 2005Conference paper
Measurements of effective thermal conductivity for advanced interconnect structures with various composite low-K dielectricsF. ChenJ. Gillet al.2004IRPS 2004Conference paper
Measurements of effective thermal conductivity for advanced interconnect structures with various composite low-k dielectricsF. ChenJ. Gillet al.2004IRPS 2004Conference paper