Publications

2 results for A. McKnight

High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- - S. Narasimha
  - K. Onishi
  - et al.
- 2006
- IEDM 2006
Conference paper
Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing
- - H.S. Yang
  - R. Malik
  - et al.
- 2004
- IEDM 2004
Conference paper