SMT and enhanced SPT with Recessed SD to improve CMOS Device PerformanceS. FangS.S. Tanet al.2008ICSICT 2008Conference paper
High performance transistors featured in an aggressively scaled 45nm bulk CMOS technologyZ. LuoN. Rovedoet al.2007VLSI Technology 2007Conference paper
Strained Si channel MOSFETs with embedded silicon carbon formed by solid phase epitaxyYaocheng LiuOleg Gluschenkovet al.2007VLSI Technology 2007Conference paper
Stress proximity technique for performance improvement with dual stress liner at 45nm technology and beyondX. ChenS. Fanget al.2006VLSI Technology 2006Conference paper
A 45nm low cost low power platform by using integrated dual-stress-liner technologyJ. YuanS.S. Tanet al.2006VLSI Technology 2006Conference paper
Process induced stress for CMOS performance improvementS. FangS.S. Tanet al.2006ICSICT 2006Conference paper
A Simplified Hybrid Orientation Technology (SHOT) for high performance CMOSB. DorisY. Zhanget al.2004VLSI Technology 2004Conference paper