Publications

2 results for D. Wehella-Gamage

High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- - S. Narasimha
  - K. Onishi
  - et al.
- 2006
- IEDM 2006
Conference paper
A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell
- - Mukesh Khare
  - S. Ku
  - et al.
- 2002
- IEDM 2002
Conference paper