Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Conference paper
Publications
43 results for D. Medeiros
Low-temperature melt processing of organic-inorganic hybrid films
- David B. Mitzi
- David R. Medeiros
- et al.
- 2002
- Chemistry of Materials
PaperEarly mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Conference paperIntercalated organic-inorganic perovskites stabilized by fluoroaryl-aryl interactions
- David B. Mitzi
- David R. Medeiros
- et al.
- 2002
- Inorganic Chemistry
PaperSensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
Conference paperCharacterization and acid diffusion measurements of new strong acid photoacid generators
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
PaperRecent advances in the development of chemically amplified resists for applications in electron beam lithography
- David R. Medeiros
- 2002
- J. Photopolym. Sci. Tech.
PaperEvolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
PaperThe effect of humidity on deprotection kinetics in chemically amplified resists
- Sean D. Burns
- David R. Medeiros
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
PaperApplication of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Paper