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4 results for A. Gutmann
Novel enhanced stressor with graded embedded SiGe source/drain for high performance CMOS devices
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Conference paperSelection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
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- SPIE Advances in Resist Technology and Processing 1999
Conference paperPlasma-etching processes for ULSI semiconductor circuits
- M. Armacost
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