Computational lithography platform for 193i-guided directed self-assembly
- Kafai Lai
- Melih Ozlem
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paper
Publications
39 results for Kafai Lai
Towards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperComputational aspects of optical lithography extension by Directed Self-Assembly
- Kafai Lai
- Chi-Chun Liu
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperReview of computational lithography modeling: Focusing on extending optical lithography and design-technology co-optimization
- Kafai Lai
- 2012
- Advanced Optical Technologies
ReviewFast source independent estimation of lithographic difficulty supporting large scale source optimization
- David Demaris
- Maria Gabrani
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperProgress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
- Chi-Chun Liu
- Jed Pitera
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperRadiometric consistency in source specifications for photolithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2011
- COSI 2011
Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solution
- Moutaz Fakhry
- Yuri Granik
- et al.
- 2011
- SPIE Photomask Technology + EUV Lithography 2011
Conference paperComputational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2011
- Journal of Vacuum Science and Technology B
PaperUnderstanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Conference paper