Germanium-on-Si MOSFETS with HFO 2 gate dielectricJ.P. DonnellyJ. Chenet al.2005ECS Meeting 2005Conference paper
Considerations for evaluating hot-electron reliability of strained Si n-channel MOSFETsD.Q. KellyS. Deyet al.2005Microelectronics ReliabilityPaper
Improved hot-electron reliability in strained-Si nMOSDavid OnsongoDavid Q. Kellyet al.2004IEEE Transactions on Electron DevicesPaper