Modeling of the diffusion of implanted boron in strained Si/Si1-xGex
- Huilong Zhu
- Kam-Leung Lee
- et al.
- 2002
- SISPAD 2002
Conference paper
Publications
4 results for Suryanarayan Hegde
Simultaneous optimization of short-channel effects and junction capacitance in pMOSFET using large-angle-tilt-implantation of nitrogen (LATIN)
- Kilho Lee
- Cheruvu Murthy
- et al.
- 2002
- IEEE Electron Device Letters
PaperMapping of Electrostatic Potential in Deep Submicron CMOS Devices by Electron Holography
- M. Gribelyuk
- M.R. McCartney
- et al.
- 2002
- Physical Review Letters
PaperField-effect transistors comprising molecular beam deposited α,ω-di-hexyl-hexathienylene and polymeric insulator
- Christos D. Dimitrakopoulos
- Bruce K. Furman
- et al.
- 1998
- Synthetic Metals
Paper