Influence of sidewall roughness on the reliability of 0.20-μm Al RIE wiringR. RavikumarH. Cichyet al.1999IITC 1999Conference paper
Challenges of Aluminum RIE Technology at sub 0.45 μm PitchesR. RavikumarR. Filippiet al.1999IITC 1999Conference paper
Cleans for Al vias in a 0.175 μm Dual Damascene ProcessJ.P. GambinoL. Clevengeret al.1999IITC 1999Conference paper