Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
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- 2000
- Microlithography 2000
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Publications
8 results for Saikumar Jayaraman
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
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- 1999
- SPIE Advances in Resist Technology and Processing 1999
PaperPolymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
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- 1999
- ACS Spring 1999
Conference paperDesign of an etch-resistant cyclic olefin photoresist
- Robert D. Allen
- Juliann Opitz
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- Microlithography 1998
Conference paperReactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
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- Microlithography 1998
Conference paperPlatform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
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- 1998
- J. Photopolym. Sci. Tech.
PaperCrosslinked polyimide foams derived from poly(imide-propylene oxide) copolymers
- J.L. Hedrick
- K.R. Carter
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- Macromolecular Chemistry and Physics
PaperHigh Tg polyimide nanofoams derived from pyromellitic dianhydride and 1,1-bis(4-aminophenyl)-1-phenyl-2,2,2-trifluoroethane
- J.L. Hedrick
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