Publications

3 results for T. Furukawa

High performance of planar double gate MOSFETs with thin backgate dielectrics
- - E.C. Jones
  - M. Ieong
  - et al.
- 2001
- DRC 2001
Conference paper
A new planarization technique, using a combination of RIE and chemical mechanical polish (CMP)
- - B. Davari
  - C. Koburger
  - et al.
- 1989
- IEDM 1989
Conference paper
Variable-size shallow trench isolation (STI) technology with diffused sidewall doping for submicron CMOS
- - B. Davari
  - C. Koburger
  - et al.
- 1988
- IEDM 1988
Conference paper