Publications

2 results for J.J. Estabil

Electromigration and current-carrying implications for aluminum-based metallurgy with tungsten stud-via interconnections
- - H.S. Rathore
  - R. Filippi
  - et al.
- 1992
- SPIE Microelectronic Processing 1992
Conference paper
Electromigration in a two-level Al-Cu interconnection with W studs
- - T. Kwok
  - C. Tan
  - et al.
- 1990
- VMIC 1990
Conference paper