In-line XPS metrology for area selective deposition processes on patterned structuresManasa MedikondaLinda Wangohet al.2026SPIE Advanced Lithography + Patterning 2026Conference paper
The Extreme Extendibility of Cu and Post-Cu Dual Damascene BEOL Interconnect TechnologyDaniel EdelsteinSon Nguyenet al.2024IEDM 2024Invited talk
Optimization of Area Selective Barrier on Different Metal InterconnectsLinda WangohAndrew Simonet al.2024ASMC 2024Talk