Publications

6 results for Curtis Durfee

Novel ellipsometry-based machine learning technique for characterization of low sensitivity critical dimensions within gate-all-around transistors
- - Houssam Chouaib
  - Valeria Dimastrodonato
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Conference paper
Epi Source-Drain Damage Mitigation During Channel Release of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Ivo Otto
  - et al.
- 2023
- ECS Meeting 2023
Conference paper
Epi Source/Drain Damage Mitigation with Inner Spacer and Buffer Optimization in Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Ivo Otto
  - et al.
- 2023
- SSDM 2023
Conference paper
Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement
- - Daniel Schmidt
  - Aron Cepler
  - et al.
- 2022
- IEEE Trans Semicond Manuf
Paper
Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Subhadeep Kal
  - et al.
- 2021
- ECS Meeting 2021
Conference paper
Nanosheet Metrology Opportunities for Technology Readiness
- - Mary Breton
  - Daniel Schmidt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paper