Texture of NiSi films on Si(001), (111), and (110) substrates
- C. Detavernier
- J.L. Jordan-Sweet
- et al.
- 2008
- Journal of Applied Physics
Paper
Publications
204 results for Christian Lavoie
In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon
- W. Knaepen
- C. Detavernier
- et al.
- 2008
- Thin Solid Films
PaperThe role of lattice mismatch and kinetics in texture development: Co 1-xNixSi2 thin films on Si(100)
- D. Smeets
- A. Vantomme
- et al.
- 2008
- Journal of Applied Physics
PaperKinetics of Ni3Si2 formation in the Ni 2Si-NiSi thin film reaction from in situ measurements
- J.A. Kittl
- M.A. Pawlak
- et al.
- 2007
- Applied Physics Letters
PaperExtendibility of NiPt silicide contacts for CMOS technology demonstrated to the 22-nm node
- Kazuya Ohuchi
- Christian Lavoie
- et al.
- 2007
- IEDM 2007
Conference paperStress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
- C. Torregiani
- C. Van Bockstael
- et al.
- 2007
- Microelectronic Engineering
PaperNi-Pt silicide formation through Ti mediating layers
- Paul Besser
- Christian Lavoie
- et al.
- 2007
- Microelectronic Engineering
PaperTransient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully silicided gate applications
- J.A. Kittl
- M.A. Pawlak
- et al.
- 2007
- Applied Physics Letters
PaperImplementation of robust nickel alloy salicide process for high-performance 65nm SOI CMOS manufacturing
- Jay Strane
- David Brown
- et al.
- 2007
- VLSI-TSA 2007
Conference paperThin film solid-state reactions forming carbides as contact materials for carbon-containing semiconductors
- W.P. Leroy
- C. Detavernier
- et al.
- 2007
- Journal of Applied Physics
Paper