Reactive diffusion in the Ni-Si system: Influence of Ni thickness on the phase formation sequence
- C. Coïa
- C. Lavoie
- et al.
- 2005
- ECS Meeting 2005
Conference paper
Publications
204 results for Christian Lavoie
Applications of synchrotron X-rays in microelectronics industry research
- Jean L. Jordan-Sweet
- Christophe Detavernier
- et al.
- 2005
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Conference paperHigh-temperature degradation of NiSi films: Agglomeration versus NiSi 2 nucleation
- D. Deduytsche
- C. Detavernier
- et al.
- 2005
- Journal of Applied Physics
PaperReactive diffusion in the Ni-Si system: Phase sequence and formation of metal-rich phases
- C. Lavoie
- C. Coia
- et al.
- 2004
- DIMAT 2004
Conference paperEvaluation of thermal stability for CMOS gate metal materials
- C. Cabral Jr.
- C. Lavoie
- et al.
- 2004
- JES
PaperCoSi2 formation in the presence of Ti, Ta or W
- C. Detavernier
- C. Lavoie
- et al.
- 2004
- Thin Solid Films
PaperAggressively scaled (0.143 μm 2) 6T-SRAM cell for the 32 nm node and beyond
- D. Fried
- J. Hergenrother
- et al.
- 2004
- IEDM 2004
Conference paperTexture of suicide films on Si(001) : The occurrence of axiotaxy in cubic CoSi 2, tetragonal α-FeSi 2 and orthorhombic NiSi
- C. Detavernier
- C. Lavoie
- 2004
- ICSICT 2004
Conference paperEvolution of microstructure in Ti-Ta bilayer thin films on polycrystalline-Si and Si(001)
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2004
- Thin Solid Films
PaperAxiotaxy of CoSi 2 thin films on Si(100) substrates and the effects of Ti alloying
- Ahmet S. Özean
- Karl F. Ludwig Jr.
- et al.
- 2004
- Journal of Applied Physics
Paper