The growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties
- H. Kim
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paper
Publications
204 results for Christian Lavoie
A self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paperEffects of alloying elements on cobalt silicide formation
- C. Lavoie
- C. Cabral Jr.
- et al.
- 2002
- Journal of Electronic Materials
PaperAmbipolar electrical transport in semiconducting single-wall carbon nanotubes
- R. Martel
- V. Derycke
- et al.
- 2001
- Physical Review Letters
PaperFormation of c54 tisi2: Effects of niobium additions on the apparent activation energy
- F.M. D’Heurle
- S.-L. Zhang
- et al.
- 2001
- Journal of Applied Physics
PaperAmbipolar electrical transport in semiconducting single-wall carbon nanotubes
- R. Martel
- V. Derycke
- et al.
- 2001
- Physical Review Letters
PaperA self-aligned silicide process for thin silicon-on-insulator MOSFETs and bulk MOSFETs with shallow junctions
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2001
- MRS Proceedings 2001
Conference paperThe use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures
- C. Cabral Jr.
- C. Lavoie
- et al.
- 2001
- Thin Solid Films
PaperInterfacial reaction pathways and kinetics during annealing of 111-textured Al/TiN bilayers: A synchrotron x-ray diffraction and transmission electron microscopy study
- J.-S. Chun
- P. Desjardins
- et al.
- 2001
- Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
PaperInterfacial reaction pathways and kinetics during annealing of epitaxial Al/TiN(001) model diffusion barrier systems
- J.-S. Chun
- P. Desjardins
- et al.
- 2001
- Thin Solid Films
Paper