Publications

43 results for David P. Klaus

A high performance BiCMOS technology using 0.25 μm CMOS and double poly 47 GHz bipolar
- - G. Shahidi
  - J. Warnock
  - et al.
- 1992
- VLSI Technology 1992
Conference paper
On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching
- - J.T. Wetzel
  - M. Jost
  - et al.
- 1989
- Ultramicroscopy
Paper
REACTIVE ION ETCHING OF MULTI-LAYER RESIST.
- - H.Y. Ng
  - D.P. Klaus
  - et al.
- 1986
- MRS Fall Meeting 1986
Conference paper