Atomic layer deposition of materials for phase-change memories
- Markku Leskelä
- Viljami Pore
- et al.
- 2009
- ECS Meeting 2009
Conference paper
Publications
97 results for Stephen Rossnagel
Atomic layer deposition of Ge2Sb2Te5 thin films
- Mikko Ritala
- Viljami Pore
- et al.
- 2009
- Microelectronic Engineering
PaperIonic field effect transistors with sub-10 nm multiple nanopores
- Sung-Wook Nam
- Michael J. Rooks
- et al.
- 2009
- Nano Letters
PaperPlasma modeling of a PEALD system for the deposition of TiO 2 and HfO 2
- Junghoon Joo
- Steve M. Rossnagel
- 2009
- Journal of the Korean Physical Society
PaperChemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
- Frances A. Houle
- Ann Fornof
- et al.
- 2008
- SPIE Advanced Lithography 2008
Conference paperMetal-containing release layers for use with UV-cure nanoimprint lithographic template materials
- F.A. Houle
- S. Raoux
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperNovel lithography-independent pore phase change memory
- M. Breitwisch
- T. Nirschl
- et al.
- 2007
- VLSI Technology 2007
Conference paperNanopore in metal-dielectric sandwich for DNA position control
- Stas Polonsky
- Steve Rossnagel
- et al.
- 2007
- Applied Physics Letters
PaperEvidence for segregation of Te in Ge2 Sb2 Te5 films: Effect on the "phase-change" stress
- L. Krusin-Elbaum
- C. Cabral
- et al.
- 2007
- Applied Physics Letters
PaperLower resistance scaled metal contacts to silicide for advanced CMOS
- A. Topol
- C. Sheraw
- et al.
- 2006
- VLSI Technology 2006
Conference paper