AFM characterization for Gate-All-Around (GAA) devices
- Mary Breton
- Jennifer Fullam
- et al.
- 2020
- SPIE Advanced Lithography 2020
Conference paper
Publications
3 results for Jason Osborne
Line top loss and line top roughness characterizations of EUV resists
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2020
- SPIE Advanced Lithography 2020
Conference paperCDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paper