Selectivity in copper chemical vapor deposition
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Applied Physics Letters
Paper
Publications
49 results for Michael Liehr
Kinetics of nucleation and growth of Si on SiO2 in very low pressure SiH4 chemical vapor deposition
- S.S. Dana
- M. Liehr
- et al.
- 1992
- Applied Physics Letters
PaperSurface analysis studies of copper chemical vapor deposition from 1,5-cyclooctadiene-copper(l)-hexafluoroacetylacetonate
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperNucleation and growth of silicon on Si02 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration
- M. Liehr
- S.S. Dana
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperReactivity of a fluorine passivated silicon surface
- Ruud A. Haring
- Michael Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperPreoxidation Si cleaning and its impact on metal oxide semiconductor characteristics
- S.R. Kasi
- M. Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperHydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
PaperChemistry of fluorine in the oxidation of silicon
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
PaperIn-situ characterization of SiO2 deposition and growth for gate-oxides (Invited Paper)
- M. Liehr
- 1991
- SPIE Processing Integration 1991
Conference paperHF and UV-ozone integrated wafer preclean: chemistry and effects on thermal gate oxide
- M. Liehr
- S.R. Kasi
- 1991
- SSDM 1991
Conference paper