Surface etching and roughening in integrated processing of thermal oxides
- M. Offenberg
- M. liehr
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
49 results for Michael Liehr
Vapor phase hydrocarbon removal for Si processing
- Srinandan R. Kasi
- M. Liehr
- 1990
- Applied Physics Letters
PaperKinetics of silicon epitaxy using SiH4 in a rapid thermal chemical vapor deposition reactor
- M. Liehr
- C.M. Greenlief
- et al.
- 1990
- Applied Physics Letters
PaperUltraclean, integrated processing of thermal oxide structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- Applied Physics Letters
PaperRole of surface passivation in the integrated processing of MOS structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- VLSI Technology 1990
Conference paperHF surface passivation failure in integrated thermal oxidation processing
- M. Liehr
- M. Offenberg
- et al.
- 1990
- SSDM 1990
Conference paperSilicon dioxide defects induced by metal impurities
- H. Dallaporta
- M. Liehr
- et al.
- 1990
- Physical Review B
PaperIn-situ characterization of impurities and defects at si interfaces
- M. Liehr
- 1989
- Proceedings of SPIE 1989
Conference paperintegrated thermal chemical vapor deposition processing for Si technology
- M. Liehr
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperHigh resolution electron energy loss spectroscopic characterization of insulators for Si technology
- M. Liehr
- P.A. Thiry
- 1990
- Journal of Electron Spectroscopy and Related Phenomena
Paper