Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics
- Xiaoxian Zhang
- John N. Myers
- et al.
- 2015
- Physical Chemistry Chemical Physics
Paper
Publications
4 results for Jeffery D. Bielefeld
Nondestructive in situ characterization of molecular structures at the surface and buried interface of silicon-supported low-k dielectric films
- John N. Myers
- Xiaoxian Zhang
- et al.
- 2015
- Journal of Physical Chemistry B
PaperIn situ observation of water behavior at the surface and buried interface of a low-K dielectric film
- Xiaoxian Zhang
- John N. Myers
- et al.
- 2014
- ACS AMI
PaperNew classes of ULK dielectrics with superior thermomechanical properties
- Yusuke Matsuda
- Sean W. King
- et al.
- 2011
- ADMETA 2011
Conference paper