Publications

3 results for Moshe Preil

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
- - Dhairya Dixit
  - Samuel O'Mullane
  - et al.
- 2015
- J. Micro/Nanolithogr. MEMS MOEMS
Paper
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
- - Dhairya Dixit
  - Samuel O'Mullane
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Advanced overlay control in volume manufacturing
- - Timothy Wiltshire
  - Christopher Ausschnitt
  - et al.
- 2011
- ASMC 2011
Conference paper