Publications

25 results for Jennifer Church

Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Conference paper
Exploration of pillar local CDU improvement options for AI applications
- - Charlie Liu
  - Hao Tang
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Invited talk
Investigation of mask absorber induced image shift in EUV lithography
- - Martin Burkhardt
  - Anuja De Silva
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paper
Patterning material challenges for improving euv stochastics
- - Anuja De Silva
  - Luciana Meli
  - et al.
- 2019
- J. Photopolym. Sci. Tech.
Paper
Study of resist hardmask interaction through surface activation layers
- - Anuja De Silva
  - Luciana Meli
  - et al.
- 2018
- EUVL 2018
Conference paper