Future of plasma etching for microelectronics: Challenges and opportunities
- Gottlieb S. Oehrlein
- Stephan M. Brandstadter
- et al.
- 2024
- Journal of Vacuum Science and Technology B
Paper
Publications
7 results for H. Kothari
Impact of source/drain silicon cap on FDSOI SiGe pMOSFET performance
- E. Augendre
- S. Maitrejean
- et al.
- 2015
- S3S 2015
Conference paperReliability challenges for the 10nm node and beyond
- 2014
- IEDM 2014
Conference paperProcess dependence of AC/DC PBTI in HKMG n-MOSFETs
- Wen Liu
- Giuseppe La Rosa
- et al.
- 2014
- IRPS 2014
Conference paperHigh performance UTBB FDSOI devices featuring 20nm gate length for 14nm node and beyond
- Q. Liu
- M. Vinet
- et al.
- 2013
- IEDM 2013
Conference paperIntrinsic dielectric stack reliability of a high performance bulk planar 20nm replacement gate high-k metal gate technology and comparison to 28nm gate first high-k metal gate process
- W. McMahon
- C. Tian
- et al.
- 2013
- IRPS 2013
Conference paperNew layout dependency in high-k/metal gate MOSFETs
- M. Hamaguchi
- Deleep R. Nair
- et al.
- 2011
- IEDM 2011
Conference paper