Predictive data analytics and machine learning enabling metrology and process control for advanced node IC fabrication
- Narender Rana
- Yunlin Zhang
- et al.
- 2015
- ASMC 2015
Conference paper
Publications
9 results for Narender Rana
Machine learning and predictive data analytics enabling metrology and process control in IC fabrication
- Narender Rana
- Yunlin Zhang
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperLeveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
PaperLeveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperBridging CD metrology gaps of advanced patterning with assistance of nanomolding
- Narender Rana
- Dario Goldfarb
- 2012
- SPIE Advanced Lithography 2012
Conference paperReconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperHybrid reference metrology exploiting patterning simulation
- Narender Rana
- Chas Archie
- 2010
- SPIE Advanced Lithography 2010
Conference paper3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- Johann Foucher
- Narender Rana
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperThe measurement uncertainty challenge of advanced patterning development 727203
- Narender Rana
- Chas Archie
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper