Defect detection strategies and process partitioning for single-expose EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Paper
Publications
33 results for Anuja De Silva
Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition - Defectivity Reduction by Monolayer Design
- Rudy J. Wojtecki
- Magi Mettry
- et al.
- 2018
- ACS AMI
PaperStudy of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018
Conference paperOn thermal interface materials with polydisperse fillers: Packing algorithm and effective properties
- Piyas Chowdhury
- Anuja De Silva
- et al.
- 2018
- InterPACK 2018
Conference paperPolymer brush as adhesion promoter for EUV patterning
- Jing Guo
- Anuja De Silva
- et al.
- 2018
- SPIE Advanced Lithography 2018
Conference paperDefect detection strategies and process partitioning for SE EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2018
- SPIE Advanced Lithography 2018
Conference paperInorganic hardmask development for EUV patterning
- Anuja De Silva
- A. Dutta
- et al.
- 2018
- SPIE Advanced Lithography 2018
Conference paperCoater/developer based techniques to improve high-resolution EUV patterning defectivity
- Koichi Hontake
- Lior Huli
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Conference paperDevelopment of amorphous silicon based EUV hardmasks through physical vapor deposition
- Anuja De Silva
- Yann Mignot
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Conference paperUltrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
- Indira Seshadri
- Anuja De Silva
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Paper