Plasma processing for advanced microelectronics beyond CMOS
- Nathan Marchack
- L. Buzi
- et al.
- 2021
- Journal of Applied Physics
Review
Publications
6 results for George Totir
Atomic Layer Deposition of Tungsten Oxide Using Nitrogen Dioxide: A Comparative Study with Other Oxygen Sources
- Damon B. Farmer
- Matthew Copel
- et al.
- 2021
- Chemistry of Materials
PaperEvaluation of emitter profiles and lateral uniformity on crystalline silicon photovoltaic cells using scanning capacitance microscopy
- Laura Kosbar
- Jochonia Nxumalo
- et al.
- 2010
- PVSC 2010
Conference paperDevelopment and characterization of advanced process technologies for the fabrication of crystalline-Si solar cells
- Satyavolu S. Papa Rao
- Kate Fisher
- et al.
- 2010
- PVSC 2010
Conference paperPost ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
- G.G. Totir
- M.M. Frank
- et al.
- 2007
- ECS Meeting 2007
Conference paperInvestigation of FinFET devices for 32nm technologies and beyond
- H. Shang
- L. Chang
- et al.
- 2006
- VLSI Technology 2006
Conference paper