Publications

3 results for Chandra Reddy

Effect of plasma N₂ and thermal NH₃ nitridation in HfO₂ for ultrathin equivalent oxide thickness
- - Min Dai
  - Yanfeng Wang
  - et al.
- 2013
- Journal of Applied Physics
Paper
High performance bulk planar 20nm CMOS technology for low power mobile applications
- - Huiling Shang
  - Sameer Jain
  - et al.
- 2012
- VLSI Technology 2012
Conference paper
A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process
- - X. Chen
  - S. Samavedam
  - et al.
- 2008
- VLSI Technology 2008
Conference paper