Poly(di-n-pentylsilane): The Spectral Consequences of a Helical Conformation in the Solid State
- R.D. Miller
- B.L. Farmer
- et al.
- 2002
- JACS
Paper
Publications
76 results for R. Sooriyakumaran
Mechanism of the Photochemical Degradation of Poly(di-n-alkylsilanes) in Solution
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- Josef Michl
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- 2002
- JACS
PaperBuilding high-performance chemically amplified resists with polymer blends
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- John Simons
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- 2002
- Microlithography 2002
Conference paperEvolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
PaperSilicon-containing resists for 157 nm applications
- Ratnam Sooriyakumaran
- Debra Fenzel-Alexander
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperIBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperAFM study of positive chemically amplified resists
- Lin Qinghuang
- Ralnam Sooriyakumaran
- et al.
- 2000
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Conference paperTransfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperMonomer reactivities and kinetics in radical copolymerization of hydroxystyrene derivatives and tert-butyl (meth)acrylate
- Hiroshi Ito
- Charlie Dalby
- et al.
- 2000
- Macromolecules
PaperToward controlled resist line edge roughness: Material origin of line edge roughness in chemically amplified positive-tone resists
- Q. Lin
- R. Sooriyakumaran
- et al.
- 2000
- Microlithography 2000
Conference paper