Novel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Paper
Publications
26 results for Ranee Kwong
Recent progress in electron-beam resists for advanced mask-making
- D. Medeiros
- A. Aviram
- et al.
- 2001
- IBM J. Res. Dev
PaperPhotoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
Conference paperA method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist-KRS
- Karen Petrillo
- James Brancaccio
- et al.
- 1997
- Microlithography 1997
Conference paperImproved underlayers for acid amplified resists
- H.S. Sachdev
- R.W. Kwong
- et al.
- 1994
- Microelectronic Engineering
PaperNew environmentally stable positive tone chemically amplified resist system - KRS
- Wu-Song Huang
- R.W. Kwong
- et al.
- 1993
- MRS Fall Meeting 1993
Conference paper