Study of near‐surface disorder and surface residues after reactive Ion etching of Silicon
- G.S. Oehrlein
- G.J. Coyle
- et al.
- 2004
- Surface and Interface Analysis
Paper
Publications
118 results for Gottlieb S. Oehrlein
Gas utilization in remote plasma cleaning and stripping applications
- B.E. Kastenmeier
- G.S. Oehrlein
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperFabrication and performance limits of sub-0.1 μm Cu interconnects
- T.S. Kuan
- C.K. Inoki
- et al.
- 2000
- Materials Research Society Symposium-Proceedings
PaperFabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperFluorocarbon high density plasmas. VII. Investigation of selective SiO2-to-Si3N4 high density plasma etch processes
- Ying Zhang
- Gottlieb S. Oehrlein
- et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperFluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
- G.S. Oehrlein
- Y. Zhang
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperFluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperReactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- O. Joubert
- G.S. Oehrlein
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperDepth profiling of the Ge concentration in SiGe alloys using in situ ellipsometry during reactive-ion etching
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- Journal of Applied Physics
PaperA photoluminescence study of CF4 reactive-ion-etched silicon: Various process conditions and magnetically enhanced etching
- A. Henry
- B. Monemar
- et al.
- 1993
- Journal of Applied Physics
Paper