Publications

2 results for Sudhar Raghunathan

EUV OPC for 56 nm metal pitch
- - Martin Burkhardt
  - Matt Colburn
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Thorough characterization of a EUV mask
- - Hiroyuki Mizuno
  - Gregory McIntyre
  - et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
Conference paper