Publications

3 results for Sy Lee

Dependence of Cu electromigration resistance on selectively deposited CVD Co cap thickness
- - C.-C. Yang
  - F. Baumann
  - et al.
- 2013
- Microelectronic Engineering
Paper
CVD Co capping layers for Cu/low-k interconnects: Cu em enhancement vs. Co thickness
- - C.-C. Yang
  - F. Baumann
  - et al.
- 2011
- IITC/MAM 2011
Conference paper
Characterization of copper electromigration dependence on selective chemical vapor deposited cobalt capping layer thickness
- - C.-C. Yang
  - F. Baumann
  - et al.
- 2011
- IEEE Electron Device Letters
Paper