The chemisorption of SiCl4, Si2Cl6 and chlorine on Si(111) 7 × 7
- L.J. Whitman
- S.A. Joyce
- et al.
- 1990
- Vacuum
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Publications
94 results for Fenton R. McFeely
Core-level photoemission investigation of atomic-fluorine adsorption on GaAs(110)
- A.B. McLean
- L.J. Terminello
- et al.
- 1989
- Physical Review B
PaperSoft x-ray photoemission study of downstream plasma enhanced chemical vapor deposited SiO2
- Bennett Robinson
- F.R. McFeely
- 1989
- Journal of Applied Physics
PaperThe interaction of CF3 radicals and CF3 radical precursors with SiO2 surfaces
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- Surface Science
PaperMechanism for chemical-vapor deposition of tungsten on silicon from tungsten hexafluoride
- Jory A. Yarmoff
- F. Read McFeely
- 1988
- Journal of Applied Physics
PaperFluorine-silicon reactions and the etching of crystalline silicon
- Chris G. Van De Walle
- F.R. McFeely
- et al.
- 1988
- Physical Review Letters
PaperMicroscopic structure of the SiO2/Si interface
- F.J. Himpsel
- F.R. McFeely
- et al.
- 1988
- Physical Review B
PaperEffect of sample doping level during etching of silicon by fluorine atoms
- J.A. Yarmoff
- F.R. McFeely
- 1988
- Physical Review B
PaperChemical selectivity in photon-stimulated desorption of fluorine from silicon
- J.A. Yarmoff
- A. Taleb-Ibrahimi
- et al.
- 1988
- Physical Review Letters
PaperSummary Abstract: Theoretical investigations of fluorine-silicon systems
- Chris G. Van de Walle
- Y. Bar-Yam
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper