Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
44 results for Luisa Bozano
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperHexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperLarge-area spatially ordered arrays of gold nanoparticles directed by lithographically confined DNA origami
- Albert M. Hung
- Christine M. Micheel
- et al.
- 2009
- Nature Nanotechnology
PaperPlacement and orientation of individual DNA shapes on lithographically patterned surfaces
- Ryan J. Kershner
- Luisa D. Bozano
- et al.
- 2009
- Nature Nanotechnology
PaperHybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperA new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Conference paperNonvolatile memory elements based on organic materials
- J. Campbell Scott
- Luisa D. Bozano
- 2007
- Advanced Materials
PaperLocal characterization of vapor-deposited electrode edges in thin film organic electronic devices
- S. Sills
- K. Unal
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperA new route to ultra-high density memory using the Micro to Nano Addressing Block (MNAB)
- R.S. Shenoy
- K. Gopalakrishnan
- et al.
- 2006
- VLSI Technology 2006
Conference paper