Publications

3 results for A. Tessier

Characterization of novel TiN/HfO₂ metal insulator semiconductor stack for 32nm eDRAM
- - Puneet Goyal
  - Sneha Gupta
  - et al.
- 2010
- IEEE International SOI Conference 2010
Conference paper
A 0.039um² high performance eDRAM cell based on 32nm high-K/metal SOI technology
- - Nauman Z. Butt
  - Kevin McStay
  - et al.
- 2010
- IEDM 2010
Conference paper
Scaling deep trench based eDRAM on SOI to 32nm and beyond
- - G. Wang
  - D. Anand
  - et al.
- 2009
- IEDM 2009
Conference paper