Publications

4 results for Ryan Deschner

Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- - Greg McIntyre
  - Michael Hibbs
  - et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Paper
Optimization of DUV lithography for high-energy well implantation
- - Ryan Deschner
  - Seong-Dong Kim
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
A 0.127 μm² high performance 65 nm SOI based embedded DRAM for on-processor applications
- - G. Wang
  - K. Cheng
  - et al.
- 2006
- IEDM 2006
Conference paper
Characterization of imaging performance for immersion lithography at NA=0.93
- - Dario Gil
  - Jaione Tirapu-Azpiroz
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paper