Rational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
24864 results for Exploratory Science
Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperHydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- Hiroshi Ito
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paperSelective enhancement of contrast blocks for MPEG/JPEG image compression
- Konstantin Y. Kupeev
- Zohar Sivan
- 2003
- VCIP 2003
Conference paperThe estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paperHardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperDiffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Conference paperHigh flexibility scalable image coding
- Pascal Frossard
- Pierre Vandergheynst
- et al.
- 2003
- VCIP 2003
Conference paperX-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Conference paperUsing the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paper