Chemical ordering of FePt nanoparticle self-assemblies by rapid thermal annealing
- H. Zeng
- Shouheng Sun
- et al.
- 2003
- Journal of Magnetism and Magnetic Materials
Conference paper
Publications
24907 results for Exploratory Science
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperPolyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Conference paperHighly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperExtendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperX-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Conference paperHydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- Hiroshi Ito
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paperSelective enhancement of contrast blocks for MPEG/JPEG image compression
- Konstantin Y. Kupeev
- Zohar Sivan
- 2003
- VCIP 2003
Conference paperThe estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paper