Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paper
Publications
26898 results for Science
Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperIBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Conference paperDeep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperRinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperHigh speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Conference paperMining and knowledge discovery from the web
- Kevin S. McCurley
- Andrew Tomkins
- 2004
- I-SPAN 2004
Conference paperMicro-four-point-probe characterization of nanowires fabricated using the nanostencil technique
- R. Lin
- M. Bammerlin
- et al.
- 2004
- Nanotechnology
PaperAnalyzing the structure of CoFe-Fe 3O 4 core-shell nanoparticles by electron imaging and diffraction
- Jing Li
- Hao Zeng
- et al.
- 2004
- Journal of Physical Chemistry B
Paper