Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
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- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
26903 results for Science
Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperChemical ordering of FePt nanoparticle self-assemblies by rapid thermal annealing
- H. Zeng
- Shouheng Sun
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- 2003
- Journal of Magnetism and Magnetic Materials
Conference paperA model for lubricant flow from disk to slider
- B. Marchon
- T. Karls
- et al.
- 2003
- INTERMAG 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperFailure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Conference paperTime evolution of lubricant-slider dynamic interactions
- Q. Dai
- B. Knigge
- et al.
- 2003
- INTERMAG 2003
Conference paperHigh flexibility scalable image coding
- Pascal Frossard
- Pierre Vandergheynst
- et al.
- 2003
- VCIP 2003
Conference paperDiffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Conference paperHydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- Hiroshi Ito
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paper