Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
26925 results for Science
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Conference paperChemical ordering of FePt nanoparticle self-assemblies by rapid thermal annealing
- H. Zeng
- Shouheng Sun
- et al.
- 2003
- Journal of Magnetism and Magnetic Materials
Conference paperA model for lubricant flow from disk to slider
- B. Marchon
- T. Karls
- et al.
- 2003
- INTERMAG 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperTime evolution of lubricant-slider dynamic interactions
- Q. Dai
- B. Knigge
- et al.
- 2003
- INTERMAG 2003
Conference paperFailure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Conference paperToward an understanding of overcoat corrosion protection
- Qing Dai
- Bing Yen
- et al.
- 2003
- INTERMAG 2003
Conference paperHardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperDiffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Conference paper