Carbon Nanotube Inter- and Intramolecular Logic Gates
- V. Derycke
- R. Martel
- et al.
- 2001
- Nano Letters
Paper
Publications
24864 results for Exploratory Science
Travel card: Airport self-check in using a wireless PDA
- T.G. Zimmerman
- S. Ihde
- et al.
- 2001
- ITSC 2001
Conference paperPolymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperThe rational design of bleachable non-chemically amplified DUV photoactive compounds
- Benjamen M. Rathsack
- Peter I. Tattersall
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperHigh resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperIBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperSilicon-containing resists for 157 nm applications
- Ratnam Sooriyakumaran
- Debra Fenzel-Alexander
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperCharacterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperCharacterization of thin and ultrathin polymer and resist films
- Dario L. Goldfarb
- Qinhuang Lin
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper