An efficient synthesis of symmetrical oligothiophenes: Synthesis and transport properties of a soluble sexithiophene derivative
- A. Afzali
- T.L. Breen
- et al.
- 2002
- Chemistry of Materials
Paper
Publications
25371 results for Science
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Conference paperSensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
Conference paperBuilding high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002
Conference paperMethods for comparing contact hole shrinking techniques with 248 nm single layer and bilayer photoresists
- Karen Petrillo
- John Simons
- et al.
- 2002
- Microlithography 2002
Conference paperCharacterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution
- Thomas Wallow
- Wendy Chan
- et al.
- 2002
- Microlithography 2002
Conference paperMultiple Parameter Continuation: Computing Implicitly Defined k-Manifolds
- Michael E. Henderson
- 2002
- IJBC
PaperRedefining clustering for high-dimensional applications
- Charu C. Aggarwal
- Philip S. Yu
- 2002
- IEEE Transactions on Knowledge and Data Engineering
PaperOrientational glasses
- U. Höchli
- K. Knorr
- et al.
- 2002
- Advances in Physics
PaperA performance study of robust load sharing strategies for distributed heterogeneous Web server systems
- Michele Colajanni
- Philip S. Yu
- 2002
- IEEE Transactions on Knowledge and Data Engineering
Paper